Quartz 5

Home

❯

Notes

❯

Patents

❯

US7609061B2 Demagnetized implant for magnetic resonance imaging

US7609061B2 Demagnetized implant for magnetic resonance imaging

2026年6月24日1分钟阅读

US7609061B2 Demagnetized implant for magnetic resonance imaging

摘要

  • 问题:植入磁铁在MRI强磁场中受扭矩、位移力、消磁及产生图像伪影
  • 方案:借助MRI设备自身磁场对植入磁铁执行消磁-成像-再磁化程序
  • 效果:未公开/无定量
  • 形态:6项权利要求/3T或6T高场MRI

关联

  • 原文(Google Patents):https://patents.google.com/patent/US7609061B2/en
  • 危害:Hazard-b0-torque
  • 危害:Hazard-b0-force
  • 危害:Hazard-image-artifact
  • 危害:Hazard-b0-malfunction

关系图谱

  • US7609061B2 Demagnetized implant for magnetic resonance imaging
  • 摘要
  • 关联

反向链接

  • Hazard MOC · b0-force(B₀ 位移力, ISO/TS 10974 Clause 11)
  • Hazard MOC · b0-malfunction(B₀ 致功能障碍, ISO/TS 10974 Clause 14)
  • Hazard MOC · b0-torque(B₀ 扭矩, ISO/TS 10974 Clause 12)
  • Hazard MOC · image-artifact(图像伪影, ISO/TS 10974 Clause —)

Created with Quartz v5.0.0 © 2026

  • GitHub
  • Discord Community